Fully Depleted SOI MOSFETs for DRAM

SOI technology has received high attention for the future high density DRAM applications. The two major requirements in any DRAM technology are long retention time and high charging efficiency. This paper discusses the disadvantages of using bulk silicon and Partially Depleted SOI devices in these terms. It is shown that a DRAM cell built with fully depleted SOI MOSFETs can store data for a long time and can transfer charge efficiently resulting in higher programming speed and lower power consumption.